Rieter reports major win for in infringement patent dispute in China
WINTERTHUR, Switzerland, February 8, 2024-
In a judgment in December 2023, the Supreme People’s Court of the People’s Republic of China ruled in favor of Rieter in a legal dispute. The case concerned the infringement of a Rieter patent by a competitor’s draw frame. Rieter protects its innovations with patents and registered designs and consistently takes action against infringements of its intellectual property.
Rieter draw frames are known for their stable operation with high sliver quality and productivity. Superb scanning precision and highest autoleveling dynamics ensure outstanding sliver evenness and thus the production of high-quality yarns. Draw frames have also been the subject of a patent litigation by Rieter in China at various levels of jurisdiction. Rieter had sued a competitor for unauthorized use of its patented draw frame technology.
Not a subscriber?